SELECTIVE DEPOSITION OF DIAMOND CRYSTALS BY CHEMICAL VAPOR-DEPOSITION USING A TUNGSTEN-FILAMENT METHOD

被引：105

作者：

HIRABAYASHI, K ^{[1
]}

TANIGUCHI, Y ^{[1
]}

TAKAMATSU, O ^{[1
]}

IKEDA, T ^{[1
]}

IKOMA, K ^{[1
]}

IWASAKIKURIHARA, N ^{[1
]}

机构：

[1] CANON INC,RES CTR,ATSUGI,KANAGAWA 24301,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 19期

关键词：

D O I：

10.1063/1.99789

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1815 / 1817

页数：3

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