Arrays of nano-dots for cellular engineering

Efficient patterning of large areas with nanometre features is required for cellular engineering applications. The final product must be made at an economic cost. 100 nm diameter pits on a 300 nm pitch have shown to be non-adhesive to a range of different mammalian cells. A strategy is described which uses an electron beam lithographic tool with focussed Gaussian beam to define shapes directly. Features as small as 20 nm. in diameter on 100 nm pitch were fabricated. It was found that focus of 20 nm spot size is critical. The effect of deflection aberrations across the writing field was investigated. Various resists have been examined. Patterns were successfully embossed in poly(caprolactone). The overall cost of a die in terms of machine time has been significantly reduced. (C) 2003 Elsevier Science B.V. All rights reserved.