Annealing effects for structural defects of silicon nitride ceramics

被引:9
作者
Munakata, F [1 ]
Sato, C [1 ]
Hirosaki, N [1 ]
Tanimura, M [1 ]
Akimune, Y [1 ]
Okamoto, Y [1 ]
Inoue, Y [1 ]
机构
[1] NISSAN ARC LTD INC, YOKOSUKA, KANAGAWA 237, JAPAN
关键词
beta-Si3N4; structural defect; dislocation; alpha-type structure; TEM;
D O I
10.2109/jcersj.105.858
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The structural defects of beta-Si3N4 grains were investigated by transmission electron microscopy (TEM). TEM analysis suggested the existence of dislocation, and or-type structure in beta-Si3N4 grains. In paticular, TEM analysis of Si3N4 seeds annealed at 2473 K under 30 MPa in N-2 indicated that the beta-Si3N4 grains contain an alpha-Si3N4 structure.
引用
收藏
页码:858 / 861
页数:4
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