PULSED ELECTRON-BEAM-INITIATED CHEMICAL LASER OPERATING ON H2/F2 CHAIN-REACTION

被引:19
作者
APRAHAMIAN, R [1 ]
WANG, JHS [1 ]
BETTS, JA [1 ]
BARTH, RW [1 ]
机构
[1] TRW SYST GRP, ONE SPACE PK, REDONDO BEACH, CA 90278 USA
关键词
D O I
10.1063/1.1655167
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:239 / 242
页数:4
相关论文
共 16 条
[1]  
APRAHAMIAN R, UNPUBLISHED
[2]   HF AND DF LASERS BY DIRECT ELECTRICAL DISCHARGE EXCITATION [J].
BYRON, SR ;
NELSON, LY ;
MULLANEY, GJ .
APPLIED PHYSICS LETTERS, 1973, 23 (10) :565-567
[3]  
COHEN N, 1971, TR017227792 AER CORP
[5]  
EMANUEL G, 1972, TR017227761 AER CORP
[6]   ELECTRON-BEAM-INITIATED CHEMICAL LASER IN SF6-H2 MIXTURES [J].
GROSS, RWF ;
WESNER, F .
APPLIED PHYSICS LETTERS, 1973, 23 (10) :559-561
[7]   AN EFFICIENTLY INITIATED PULSED H2 + F2 LASER [J].
KERBER, RL ;
CHING, A ;
LUNDQUIST, ML ;
WHITTIER, JS .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1973, QE 9 (06) :607-609
[8]   CHARACTERISTICS OF AN ELECTRON-BEAM-INITIATED PULSED CHEMICAL LASER [J].
PAN, YL ;
TURNER, CE ;
PETTIPIECE, KJ .
CHEMICAL PHYSICS LETTERS, 1971, 10 (05) :577-+
[9]   PULSED HF CHEMICAL LASER WITH HIGH ELECTRICAL EFFICIENCY [J].
PARKER, JV ;
STEPHENS, RR .
APPLIED PHYSICS LETTERS, 1973, 22 (09) :450-452
[10]   PRESSURE DEPENDENCY OF NF3-H2 TRANSVERSE-DISCHARGE PULSE-INITIATED HF CHEMICAL LASER [J].
PEARSON, RK ;
COWLES, JO ;
HERMANN, GL ;
PETTIPIECE, KJ ;
GREGG, DW .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1973, QE 9 (07) :723-730