ELECTRON-BEAM-INITIATED CHEMICAL LASER IN SF6-H2 MIXTURES

被引：16

作者：

GROSS, RWF ^{[1
]}

WESNER, F ^{[1
]}

机构：

[1] MAX PLANCK INST PLASMA PHYS, 8046 GARCHING, GERMANY

来源：

APPLIED PHYSICS LETTERS | 1973年 / 23卷 / 10期

关键词：

D O I：

10.1063/1.1654748

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：559 / 561

页数：3

共 8 条

[1] COLD-CATHODE ELECTRON-BEAM-CONTROLLED CO2-LASER AMPLIFIER [J].

AHLSTROM, HG ;

HOLZRICH.JF ;

KAN, T ;

INGLESAK.G ;

JENSON, J ;

KOLB, AC .

APPLIED PHYSICS LETTERS, 1972, 21 (10) :492-&

[2]

BASOV NG, 1973, ZH EKSP TEOR FIZ+, V64, P108

[3] ELECTRON-BEAM-CONTROLLED ELECTRICAL DISCHARGE AS A METHOD OF PUMPING LARGE VOLUMES OF CO2-LASER MEDIA AT HIGH-PRESSURE [J].

FENSTERMACHER, CA ;

BOYER, K ;

NUTTER, MJ ;

LELAND, WT .

APPLIED PHYSICS LETTERS, 1972, 20 (02) :56-+

[4]

GREGG DW, 1971, CHEM PHYS LETT, V8, P609, DOI 10.1016/0009-2614(71)80106-9

[5]

GROSS RWF, UNPUBLISHED

[6] COMPUTER MODELING AND PARAMETRIC STUDY FOR A PULSED H2 + F2 LASER [J].

KERBER, RL ;

WHITTIER, JS ;

EMANUEL, G .

APPLIED OPTICS, 1972, 11 (05) :1112-&

[7] PARAMETER STUDY OF A 10-J HYDROGEN-FLUORIDE LASER [J].

PUMMER, H ;

BREITFELD, W ;

WEDLER, H ;

KLEMENT, G ;

KOMPA, KL .

APPLIED PHYSICS LETTERS, 1973, 22 (07) :319-320

[8] EFFECT OF H2 PRESSURE ON PULSED H2+F2 LASER - EXPERIMENT AND THEORY [J].

SUCHARD, SN ;

WHITTIER, JS ;

KERBER, RL ;

EMANUEL, G .

JOURNAL OF CHEMICAL PHYSICS, 1972, 57 (12) :5065-&

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