BALLISTIC ELECTRON-TRANSPORT IN THIN SILICON DIOXIDE FILMS

被引：83

作者：

FISCHETTI, MV

DIMARIA, DJ

DORI, L

BATEY, J

TIERNEY, E

STASIAK, J

机构：

来源：

PHYSICAL REVIEW B | 1987年 / 35卷 / 09期

关键词：

D O I：

10.1103/PhysRevB.35.4404

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：4404 / 4415

页数：12

共 46 条

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