学术探索
学术期刊
新闻热点
数据分析
智能评审

DISPLACEMENT MEASUREMENT FROM DOUBLE-EXPOSURE LASER PHOTOGRAPHS

被引：282
作者：
ARCHBOLD, E
ENNOS, AE
机构：
来源：
OPTICA ACTA | 1972年 / 19卷 / 04期
关键词：
D O I：
10.1080/713818559
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：253 / &
相关论文
共 8 条
[1]   RECORDING OF IN-PLANE SURFACE DISPLACEMENT BY DOUBLE-EXPOSURE SPECKLE PHOTOGRAPHY [J].
ARCHBOLD, E ;
BURCH, JM ;
ENNOS, AE .
OPTICA ACTA, 1970, 17 (12) :883-&
[2]   PRODUCTION OF MULTIPLE BEAM FRINGES FROM PHOTOGRAPHIC SCATTERERS [J].
BURCH, JM ;
TOKARSKI, JM .
OPTICA ACTA, 1968, 15 (02) :101-&
[3]   LASER SPECKLE AND ITS ELIMINATION [J].
GABOR, D .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (05) :509-&
[4]   INTERFEROMETRIC DISPLACEMENT MEASUREMENT ON SCATTERING SURFACES UTILIZING SPECKLE EFFECT [J].
LEENDERTZ, JA .
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1970, 3 (03) :214-+
[5]  
MASSEY GA, 1968, CR985 NASA CONTR REP
[6]  
STETSON KA, 1970, ENGINEERING USES HOL, P307
[7]  
TIZIANI HJ, 1971, OPTICA ACTA, V18, P981
[8]   FORMATION AND LOCALIZATION OF HOLOGRAPHICALLY PRODUCED INTERFERENCE FRINGES [J].
TSURUTA, T ;
SHIOTAKE, N ;
ITOH, Y .
OPTICA ACTA, 1969, 16 (06) :723-&
1