ON THE CHOICE OF THE OPTIMUM SILICON SUBSTRATE FOR CCD/CHOS TECHNOLOGY

被引：0

作者：

P.BELLUTTI

M.BOSCARDIN

G.SONCINI

M.ZEN

N.ZORZI

机构：

[1] IRST

[2] Microsensors and System Integration Division

[3] 38050 Povo - Trento

[4] Italy Dipartimento di Ingegneria dei Materiali - Universita di Trento

[5] 38050 Mesiano - Trento

[6] Italy

关键词：

CCD; ON THE CHOICE OF THE OPTIMUM SILICON SUBSTRATE FOR CCD/CHOS TECHNOLOGY;

会议名称：

1995 4th International Conference on Solid-State and Integrated Circuit Technology

会议时间：

1600-01-01

会议地点：

Beijing, China

中图分类号：

TN386.5 [电荷耦合器件]

学科分类号：

0805 080501 080502 080903

类型：

摘要：

<正> This work reports on the analysis of the experimental data aimed at the developing of a CCD/CMOS process starting from a CCD one. The obtained results allow the selection of an optimized silicon substrate in terms of interstitial oxygen concentration [Oi] and gives additional information on the role of [Oi] on device electrical performances and on processing induced defects.

引用

页码：208 / 210

页数：3

共 8 条

[1] SILICON BASED NANOSTRUCTRUCTURES——TECHNOLOGY & APPLICATION [C].

第一届全国纳米技术与应用学术会议

,1600

[2] THE APPLICATION OF POROUS SILICON TECHNOLOGY IN THERMISTOR SENSOR [C].

XINJUN WANG AND ZONGSHENG LAI Dept of Electronics Engineering, East China Normal University, Shanghai. , China .

1995 4th International Conference on Solid-State and Integrated Circuit Technology

,1600

[3] MATERIALS ASPECT OF COMPOUND SEMICONDUCTOR ON SILICON TECHNOLOGY [C].

EL-HANG LEE ;

M.ABDUL AWAL ;

S.J.PEARTON ;

N.CHAND ;

R.LUM .

The Second International Conference on Solid State and Integrated Circuit Technology

,1989

[4] TRENDS IN SILICON-ON-INSULATOR(SOI) TECHNOLOGY [C].

Sheng S.Li .

The Second International Conference on Solid State and Integrated Circuit Technology

,1989

[5] FUTURE PERSPECTIVES OF SILICON TECHNOLOGY BEYOND 0.5um [C].

EISUKE ARAI .

The Third International Conference on Solid State and Integrated Circuit Technology

,1600

[6] AN INVESTIGATION OF THE PROPERTIES OF SILICON NITRIDE(SiNx)THIN FILMS PREPARED BY RF SPUTTERING FOR APPLICATION IN SOLAR CELL TECHNOLOGY [C].

Negin Manavizadeh ;

Alireza Khodayari ;

Ebrahim Asl-Soleimani .

2007世界太阳能大会

,2007

[7] A NOVEL METHOD FOR FABRICATING CARBON FIBRE REINFORCED SILICON CARBIDE COMPOSITES VIA 3D PRINTING TECHNOLOGY [C].

Wei Zhu, ;

Hua Fu ;

Zhongfeng Xu ;

Yusheng Shi ;

Xinyu Shao ;

Chunze Yan .

第二十一届国际复合材料大会

,2017

[8] HIGH-PERFORMANCE POLYCRYSTALLINE SILICON THIN-FILM TRANSISTOR TECHNOLOGY USING LOW-TEMPERATURE METAL-INDUCED UNILATERAL CRYSTALLIZATION [C].

Man Wong ;

Hoi S. Kwok .

第8届国际材联电子材料国际研讨会

,1600

← 1 →