SUCCESSIVE ADSORPTIONS OF HYDROGEN BROMIDE AND HYDROGEN SULFIDE ON VAPOR-DEPOSITED LEAD MONOXIDE LAYERS

被引：2

作者：

BOONSTRA, AH

SIDLER, RMA

机构：

来源：

关键词：

D O I：

10.1149/1.2404442

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1193 / &

共 12 条

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