TUNNELING IN THIN MOS STRUCTURES

被引:199
作者
MASERJIAN, J [1 ]
机构
[1] CALTECH, JET PROP LAB, PASADENA, CA 91103 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 06期
关键词
D O I
10.1116/1.1318719
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:996 / 1003
页数:8
相关论文
共 16 条
[1]   FIELD IONIZATION NEAR NONUNIFORM METAL SURFACES [J].
ALFERIEFF, ME ;
DUKE, CB .
JOURNAL OF CHEMICAL PHYSICS, 1967, 46 (03) :938-+
[2]   BAND STRUCTURES AND PSEUDOPOTENTIAL FORM FACTORS FOR 14 SEMICONDUCTORS OF DIAMOND AND ZINC-BLENDE STRUCTURES [J].
COHEN, ML ;
BERGSTRESSER, TK .
PHYSICAL REVIEW, 1966, 141 (02) :789-+
[3]   TUNNELING INTO INTERFACE STATES OF MOS STRUCTURES [J].
DAHLKE, WE .
APPLIED PHYSICS LETTERS, 1967, 10 (10) :261-&
[4]  
DISTEFANO TH, PRIVATE COMMUNICATIO
[5]  
DUKE CB, 1969, SOLID STATE PHYS S10, P57
[6]  
Franz W., 1956, HDB PHYS, V18, P155
[7]   ZUR BERECHNUNG DES TUNNELSTROMS DURCH EINE TRAPEZFORMIGE POTENTIALSTUFE [J].
GUNDLACH, KH .
SOLID-STATE ELECTRONICS, 1966, 9 (10) :949-&
[8]   DETERMINATION OF DISPERSION-RELATION IN TUNNEL STRUCTURES - INFLUENCE OF BARRIER SHAPE AND VALIDITY OF WKB APPROXIMATION [J].
GUNDLACH, KH ;
KADLEC, J .
SOLID-STATE ELECTRONICS, 1973, 16 (07) :787-792
[9]   FOWLER-NORDHEIM TUNNELING INTO THERMALLY GROWN SIO2 [J].
LENZLINGER, M ;
SNOW, EH .
JOURNAL OF APPLIED PHYSICS, 1969, 40 (01) :278-+
[10]   CURRENTS THROUGH THIN FILMS OF ALUMINUM NITRIDE [J].
LEWICKI, G ;
MEAD, CA .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1968, 29 (07) :1255-&