THE EFFECTS OF WATER ON OXIDE AND INTERFACE TRAPPED CHARGE GENERATION IN THERMAL SIO2-FILMS

被引：202

作者：

FEIGL, FJ ^{[1
]}

YOUNG, DR ^{[1
]}

DIMARIA, DJ ^{[1
]}

LAI, S ^{[1
]}

CALISE, J ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 09期

关键词：

D O I：

10.1063/1.329502

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5665 / 5682

页数：18

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