S-SHIFT CURVE CHARACTERISTICS OF SI-O STRETCHING BAND OF AMORPHOUS SILICA

被引：25

作者：

SATO, K

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1970年 / 117卷 / 08期

关键词：

D O I：

10.1149/1.2407722

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1065 / &

共 20 条

[1] THERMAL OXIDATION OF HEAVILY DOPED SILICON [J].

DEAL, BE ;

SKLAR, M .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (04) :430-+

[2] RATES OF FORMATION OF THERMAL OXIDES OF SILICON [J].

EVITTS, HC ;

COOPER, HW ;

FLASCHEN, SS .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (06) :688-690

[3]

HERZBERG G, 1967, ELECTRONIC SPECTRA P, P419

[4]

HERZBERG G, 1953, SPECTRA DIATOMIC MOL, P75

[5]

HERZBERG G, 1953, INFRARED RAMAN SPECT, P61

[6] THEORY OF OPTICAL PROPERTIES OF QUARTZ IN INFRARED [J].

KLEINMAN, DA ;

SPITZER, WG .

PHYSICAL REVIEW, 1962, 125 (01) :16-&

[7] THE MECHANISMS FOR SILICON OXIDATION IN STEAM AND OXYGEN [J].

LIGENZA, JR ;

SPITZER, WG .

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1960, 14 :131-136

[8] VIBRATION FREQUENCIES AND BINDING FORCES IN SOME SILICATE GROUPS [J].

MATOSSI, F .

JOURNAL OF CHEMICAL PHYSICS, 1949, 17 (08) :679-685

[9]

MATOSSI F, 1930, ULTRAROTE SPECTRUM, P318

[10] STRUCTURAL EVALUATION OF SILICON OXIDE FILMS [J].

PLISKIN, WA ;

LEHMAN, HS .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (10) :1013-&

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