PREPARATION OF ATOMICALLY CLEAN SURFACES OF SI AND GE BY HEATING IN VACUUM

被引：37

作者：

JONA, F

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来源：

APPLIED PHYSICS LETTERS | 1965年 / 6卷 / 10期

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D O I：

10.1063/1.1754133

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：205 / &

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共 13 条

[1] CLEANING OF SILICON SURFACES BY HEATING IN HIGH VACUUM [J].

ALLEN, FG ;

EISINGER, J ;

HAGSTRUM, HD ;

LAW, JT .

JOURNAL OF APPLIED PHYSICS, 1959, 30 (10) :1563-1571

[2] VARIATION OF CONTACT POTENTIAL WITH CRYSTAL FACE FOR GERMANIUM [J].

ALLEN, FG ;

FOWLER, AB .

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1957, 3 (1-2) :107-114

[3] ION BOMBARDMENT-CLEANING OF GERMANIUM AND TITANIUM AS DETERMINED BY LOW-ENERGY ELECTRON DIFFRACTION [J].

FARNSWORTH, HE ;

SCHLIER, RE ;

GEORGE, TH ;

BURGER, RM .

JOURNAL OF APPLIED PHYSICS, 1955, 26 (02) :252-253

[4]

GREGOR L, TO BE PUBLISHED

[5] STRUCTURES OF CLEAN SURFACES OF GERMANIUM AND SILICON .1. [J].

LANDER, JJ ;

MORRISON, J .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (05) :1403-&

[6] LOW-ENERGY ELECTRON DIFFRACTION STUDY OF SILICON SURFACE STRUCTURES [J].

LANDER, JJ ;

MORRISON, J .

JOURNAL OF CHEMICAL PHYSICS, 1962, 37 (04) :729-&

[7] STRUCTURAL PROPERTIES OF CLEAVED SILICON AND GERMANIUM SURFACES [J].

LANDER, JJ ;

GOBELL, GW ;

MORRISON, J .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (08) :2298-+

[8] SCATTERING FACTORS AND OTHER PROPERTIES OF LOW-ENERGY ELECTRON DIFFRACTION [J].

LANDER, JJ ;

MORRISON, J .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (12) :3517-&

[9] LOW-ENERGY ELECTRON-DIFFRACTION STUDY OF SURFACE REACTIONS OF GERMANIUM WITH OXYGEN AND WITH IODINE .2. [J].

LANDER, JJ ;

MORRISON, J .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (05) :1411-&

[10] THE ADSORPTION OF GASES ON A GERMANIUM SURFACE [J].

LAW, JT .

JOURNAL OF PHYSICAL CHEMISTRY, 1955, 59 (06) :543-549