STUDIES ON AL2O3-TI-MO-AU METALLIZATION SYSTEM

被引:24
作者
HARRIS, JM
LUGUJJO, E
CAMPISANO, SU
NICOLET, MA
SHIMA, R
机构
[1] CALTECH,PASADENA,CA 91125
[2] JET PROP LAB,PASADENA,CA 91104
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 01期
关键词
D O I
10.1116/1.568580
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:524 / 527
页数:4
相关论文
共 11 条
[1]   APPLICATION OF MEV BACKSCATTERING TO THIN-FILM DIFFUSION PROBLEMS [J].
CAMPISANO, SU ;
FOTI, G ;
GRASSO, F ;
RIMINI, E .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01) :448-448
[2]   PRINCIPLES AND APPLICATIONS OF ION-BEAM TECHNIQUES FOR ANALYSIS OF SOLIDS AND THIN-FILMS [J].
CHU, WK ;
MAYER, JW ;
NICOLET, MA ;
BUCK, TM ;
AMSEL, G ;
EISEN, F .
THIN SOLID FILMS, 1973, 17 (01) :1-41
[3]  
Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700
[4]  
HIRT JP, 1969, PHYS THIN FILMS, V4, P60
[5]   KINETICS OF SILICIDE FORMATION BY THIN-FILMS OF V ON SI AND SIO2 SUBSTRATES [J].
KRAUTLE, H ;
NICOLET, MA ;
MAYER, JW .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (08) :3304-3308
[6]  
MCDONALD RR, 1970, ASTRONAUT AERONAUT, V8, P36
[7]  
RHODES W, 1971, NBS348 SPEC PUB, P271
[8]  
SCHNABLE GL, 1967, 6 ANN REL PHYS S LOS, P170
[9]   COMPOSITE FILM INTERFACE CONTROL BY SEQUENTIAL SPUTTERING [J].
SHIMA, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01) :71-71
[10]   RELATIONSHIP BETWEEN SUBSTRATE SURFACE CHEMISTRY AND ADHESION OF THIN-FILMS [J].
SUNDAHL, RC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01) :181-&