DECONVOLUTION OF CONCENTRATION DEPTH PROFILES FROM ANGLE RESOLVED X-RAY PHOTOELECTRON-SPECTROSCOPY DATA

被引：84

作者：

BUSSING, TD

HOLLOWAY, PH

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 05期

关键词：

D O I：

10.1116/1.572910

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1973 / 1981

页数：9

共 12 条

[1]

Bellman R, 1966, NUMERICAL INVERSION, DOI DOI 10.2307/2004790

[2]

Fadley C. S., 1976, Progress in Solid State Chemistry, V11, P265, DOI 10.1016/0079-6786(76)90013-3

[3] SURFACE ANALYSIS AND ANGULAR-DISTRIBUTIONS IN X-RAY PHOTOELECTRON-SPECTROSCOPY [J].

FADLEY, CS ;

BAIRD, RJ ;

SIEKHAUS, W ;

NOVAKOV, T ;

BERGSTROM, SA .

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1974, 4 (02) :93-137

[4]

FADLEY CS, 1985, PROGR SURFACE SCI

[5] SURFACE SENSITIVITY AND ANGULAR DEPENDENCE OF X-RAY PHOTOELECTRON SPECTRA [J].

FRASER, WA ;

FLORIO, JV ;

DELGASS, WN ;

ROBERTSON, WD .

SURFACE SCIENCE, 1973, 36 (02) :661-674

[6] ULTRASOFT-X-RAY REFLECTION, REFRACTION, AND PRODUCTION OF PHOTOELECTRONS (100-1000-EV REGION) [J].

HENKE, BL .

PHYSICAL REVIEW A, 1972, 6 (01) :94-&

[7] PROPERTIES OF OXIDIZED SILICON AS DETERMINED BY ANGULAR-DEPENDENT X-RAY PHOTOELECTRON-SPECTROSCOPY [J].

HILL, JM ;

ROYCE, DG ;

FADLEY, CS ;

WAGNER, LF ;

GRUNTHANER, FJ .

CHEMICAL PHYSICS LETTERS, 1976, 44 (02) :225-231

[8] CHARACTERIZATION OF CONTAMINATION LAYERS BY EMISSION ANGLE DEPENDENT XPS WITH A DOUBLE-PASS CMA [J].

HOFMANN, S ;

SANZ, JM .

SURFACE AND INTERFACE ANALYSIS, 1984, 6 (02) :75-77

[9]

Hofmann S., 1982, J TRACE MICROPROBE T, V1, P213

[10] DETERMINATION OF DEPTH PROFILES BY ANGULAR DEPENDENT X-RAY PHOTOELECTRON-SPECTRA [J].

IWASAKI, H ;

NISHITANI, R ;

NAKAMURA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1978, 17 (09) :1519-1523

← 1 2 →