X-RAY REFLECTIVITY AND ADSORPTION-ISOTHERM STUDY OF FRACTAL SCALING IN VAPOR-DEPOSITED FILMS

被引：118

作者：

CHIARELLO, R ^{[1
]}

PANELLA, V ^{[1
]}

KRIM, J ^{[1
]}

THOMPSON, C ^{[1
]}

机构：

[1] POLYTECH INST NEW YORK,DEPT PHYS,BROOKLYN,NY 11201

来源：

PHYSICAL REVIEW LETTERS | 1991年 / 67卷 / 24期

关键词：

D O I：

10.1103/PhysRevLett.67.3408

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We have carried out x-ray reflectivity and adsorption measurements on thermally evaporated silver and gold films deposited onto substrates held at 80, 300, and 500 K to investigate whether the surfaces of such films are fractal in nature. Both techniques indicate self-affine fractal scaling for Ag films deposited at near-normal incidence onto substrates held at 80 K.

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页码：3408 / 3411

页数：4

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