Nanowire arrays defined by nanoimprint lithography

被引：342

作者：

Mårtensson, T ^{[1
]}

Carlberg, P ^{[1
]}

Borgstrom, M ^{[1
]}

Montelius, L ^{[1
]}

Seifert, W ^{[1
]}

Samuelson, L ^{[1
]}

机构：

[1] Lund Univ, Nanometer Consortium, S-22100 Lund, Sweden

来源：

NANO LETTERS | 2004年 / 4卷 / 04期

关键词：

D O I：

10.1021/nl035100s

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We demonstrate the use of nanoimprint lithography to define arrays of vertical InP nanowires. Each nanowire is individually seeded from a catalyzing gold particle and then grown via vapor-liquid-solid growth in a metal-organic vapor phase epitaxy system. The diameter and position of each nanowire can be controlled to create engineered arrays, demonstrated with a hexagonal photonic crystal pattern. This combination of nanoimprint and self-assembly of nanostructures is attractive for photonics and electronics, as well as in life sciences.

引用

页码：699 / 702

页数：4

共 28 条

[1] Nanotechnology: Wired for success [J].

Appell, D .

NATURE, 2002, 419 (6907) :553-555

[2] Improving stamps for 10 nm level wafer scale nanoimprint lithography [J].

Beck, M ;

Graczyk, M ;

Maximov, I ;

Sarwe, EL ;

Ling, TGI ;

Keil, M ;

Montelius, L .

MICROELECTRONIC ENGINEERING, 2002, 61-2 :441-448

[3] Nanowire resonant tunneling diodes [J].

Björk, MT ;

Ohlsson, BJ ;

Thelander, C ;

Persson, AI ;

Deppert, K ;

Wallenberg, LR ;

Samuelson, L .

APPLIED PHYSICS LETTERS, 2002, 81 (23) :4458-4460

[4] One-dimensional steeplechase for electrons realized [J].

Björk, MT ;

Ohlsson, BJ ;

Sass, T ;

Persson, AI ;

Thelander, C ;

Magnusson, MH ;

Deppert, K ;

Wallenberg, LR ;

Samuelson, L .

NANO LETTERS, 2002, 2 (02) :87-89

[5] Size- and shape-controlled GaAs nano-whiskers grown by MOVPE:: a growth study [J].

Borgström, M ;

Deppert, K ;

Samuelson, L ;

Seifert, W .

JOURNAL OF CRYSTAL GROWTH, 2004, 260 (1-2) :18-22

[6]

Cabodi M, 2002, ELECTROPHORESIS, V23, P3496, DOI 10.1002/1522-2683(200210)23:20<3496::AID-ELPS3496>3.0.CO

[7]

2-9

[8] Lift-off process for nanoimprint lithography [J].

Carlberg, P ;

Graczyk, M ;

Sarwe, EL ;

Maximov, I ;

Beck, M ;

Montelius, L .

MICROELECTRONIC ENGINEERING, 2003, 67-8 :203-207

[9] Imprint lithography with 25-nanometer resolution [J].

Chou, SY ;

Krauss, PR ;

Renstrom, PJ .

SCIENCE, 1996, 272 (5258) :85-87

[10] Nanowire nanosensors for highly sensitive and selective detection of biological and chemical species [J].

Cui, Y ;

Wei, QQ ;

Park, HK ;

Lieber, CM .

SCIENCE, 2001, 293 (5533) :1289-1292

← 1 2 3 →