EXPERIMENTAL ASPECTS OF TUNNELING IN METAL-SEMICONDUCTOR BARRIERS

被引：34

作者：

CONLEY, JW

TIEMANN, JJ

机构：

来源：

关键词：

D O I：

10.1063/1.1710017

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2880 / &

共 27 条

[1]

BERMAN S, 1964, GP1100 NSF

[2]

CONLEY JJ, TO BE PUBLISHED

[3] ELECTRON TUNNELING IN METAL-SEMICONDUCTOR BARRIERS [J].

CONLEY, JW ;

DUKE, CB ;

MAHAN, GD ;

TIEMANN, JJ .

PHYSICAL REVIEW, 1966, 150 (02) :466-&

[4]

CONLEY JW, UNPUBLISHED

[5]

DOUGLASS DH, 1964, PROGRESS LOW TEMPERA, pCH3

[6] BISB ALLOY TUNNEL JUNCTIONS [J].

ESAKI, L ;

STILES, PJ .

FRITZSCHE, H ;

TIEMANN, JJ .

PHYSICAL REVIEW, 1963, 130 (02) :617-&

[8]

GECHWEND VF, 1963, Z NATURFORSCH, VA 18, P1366

[9] STUDY OF SUPERCONDUCTORS BY ELECTRON TUNNELING [J].

GIAEVER, I ;

MEGERLE, K .

PHYSICAL REVIEW, 1961, 122 (04) :1101-&

[10]

HALL RN, 1960, PHYS REV LETT, V4, P457