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ALTERNATIVE MARKER EXPERIMENT IN FORMATION OF MO AND W SILICIDES
被引:53
作者
:
BAGLIN, J
论文数:
0
引用数:
0
h-index:
0
BAGLIN, J
DHEURLE, F
论文数:
0
引用数:
0
h-index:
0
DHEURLE, F
PETERSSON, S
论文数:
0
引用数:
0
h-index:
0
PETERSSON, S
机构
:
来源
:
APPLIED PHYSICS LETTERS
|
1978年
/ 33卷
/ 04期
关键词
:
D O I
:
10.1063/1.90341
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:289 / 290
页数:2
相关论文
共 13 条
[1]
GROWTH KINETICS OBSERVED IN FORMATION OF METAL SILICIDES ON SILICON
[J].
BOWER, RW
论文数:
0
引用数:
0
h-index:
0
BOWER, RW
;
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
MAYER, JW
.
APPLIED PHYSICS LETTERS,
1972,
20
(09)
:359
-&
[2]
IMPLANTED NOBLE-GAS ATOMS AS DIFFUSION MARKERS IN SILICIDE FORMATION
[J].
CHU, WK
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CHU, WK
;
LAU, SS
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
LAU, SS
;
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
MAYER, JW
;
MULLER, H
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
MULLER, H
.
THIN SOLID FILMS,
1975,
25
(02)
:393
-402
[3]
REACTION-KINETICS OF MOLYBDENUM THIN-FILMS ON SILICON(111) SURFACE
[J].
GUIVARCH, A
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
GUIVARCH, A
;
AUVRAY, P
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
AUVRAY, P
;
BERTHOU, L
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
BERTHOU, L
;
LECUN, M
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LECUN, M
;
BOULET, JP
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
BOULET, JP
;
HENOC, P
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
HENOC, P
;
PELOUS, G
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
PELOUS, G
;
MARTINEZ, A
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
MARTINEZ, A
.
JOURNAL OF APPLIED PHYSICS,
1978,
49
(01)
:233
-237
[4]
ANALYSIS OF FORMATION OF HAFNIUM SILICIDE ON SILICON
[J].
KIRCHER, CJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
KIRCHER, CJ
;
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
MAYER, JW
;
TU, KN
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
TU, KN
;
ZIEGLER, JF
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
ZIEGLER, JF
.
APPLIED PHYSICS LETTERS,
1973,
22
(02)
:81
-83
[5]
IRON SILICIDE THIN-FILM FORMATION AT LOW-TEMPERATURES
[J].
LAU, SS
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
LAU, SS
;
FENG, JSY
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
FENG, JSY
;
OLOWOLAFE, JO
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
OLOWOLAFE, JO
;
NICOLET, MA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
NICOLET, MA
.
THIN SOLID FILMS,
1975,
25
(02)
:415
-422
[6]
REACTION-KINETICS OF TUNGSTEN THIN-FILMS ON SILICON (100) SURFACES
[J].
LOCKER, LD
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
LOCKER, LD
;
CAPIO, CD
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
CAPIO, CD
.
JOURNAL OF APPLIED PHYSICS,
1973,
44
(10)
:4366
-4369
[7]
SILICIDE FORMATION IN THIN MOLYBDENUM AND TUNGSTEN FILMS ON SINGLE-CRYSTAL SILICON SUBSTRATES AT RELATIVELY LOW-TEMPERATURES
[J].
OERTEL, B
论文数:
0
引用数:
0
h-index:
0
机构:
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
OERTEL, B
;
SPERLING, R
论文数:
0
引用数:
0
h-index:
0
机构:
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
SPERLING, R
.
THIN SOLID FILMS,
1976,
37
(02)
:185
-194
[8]
RADIOACTIVE SILICON AS A MARKER IN THIN-FILM SILICIDE FORMATION
[J].
PRETORIUS, R
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
PRETORIUS, R
;
RAMILLER, CL
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
RAMILLER, CL
;
LAU, SS
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
LAU, SS
;
NICOLET, MA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
NICOLET, MA
.
APPLIED PHYSICS LETTERS,
1977,
30
(10)
:501
-503
[9]
GROWTH MECHANISM FOR SOLID-PHASE EPITAXY OF SI IN SI (100)/PD2SI/SI(AMORPHOUS) SYSTEM STUDIED BY A RADIOACTIVE-TRACER TECHNIQUE
[J].
PRETORIUS, R
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CALTECH,PASADENA,CA 91125
PRETORIUS, R
;
LIAU, ZL
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CALTECH,PASADENA,CA 91125
LIAU, ZL
;
LAU, SS
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CALTECH,PASADENA,CA 91125
LAU, SS
;
NICOLET, MA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CALTECH,PASADENA,CA 91125
NICOLET, MA
.
JOURNAL OF APPLIED PHYSICS,
1977,
48
(07)
:2886
-2890
[10]
PRETORIUS R, UNPUBLISHED
←
1
2
→
共 13 条
[1]
GROWTH KINETICS OBSERVED IN FORMATION OF METAL SILICIDES ON SILICON
[J].
BOWER, RW
论文数:
0
引用数:
0
h-index:
0
BOWER, RW
;
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
MAYER, JW
.
APPLIED PHYSICS LETTERS,
1972,
20
(09)
:359
-&
[2]
IMPLANTED NOBLE-GAS ATOMS AS DIFFUSION MARKERS IN SILICIDE FORMATION
[J].
CHU, WK
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CHU, WK
;
LAU, SS
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
LAU, SS
;
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
MAYER, JW
;
MULLER, H
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
MULLER, H
.
THIN SOLID FILMS,
1975,
25
(02)
:393
-402
[3]
REACTION-KINETICS OF MOLYBDENUM THIN-FILMS ON SILICON(111) SURFACE
[J].
GUIVARCH, A
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
GUIVARCH, A
;
AUVRAY, P
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
AUVRAY, P
;
BERTHOU, L
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
BERTHOU, L
;
LECUN, M
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LECUN, M
;
BOULET, JP
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
BOULET, JP
;
HENOC, P
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
HENOC, P
;
PELOUS, G
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
PELOUS, G
;
MARTINEZ, A
论文数:
0
引用数:
0
h-index:
0
机构:
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
LAB AUTOMAT & ANAL SYST,7 RUE COLONEL ROCH,F-31400 TOULOUSE,FRANCE
MARTINEZ, A
.
JOURNAL OF APPLIED PHYSICS,
1978,
49
(01)
:233
-237
[4]
ANALYSIS OF FORMATION OF HAFNIUM SILICIDE ON SILICON
[J].
KIRCHER, CJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
KIRCHER, CJ
;
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
MAYER, JW
;
TU, KN
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
TU, KN
;
ZIEGLER, JF
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
ZIEGLER, JF
.
APPLIED PHYSICS LETTERS,
1973,
22
(02)
:81
-83
[5]
IRON SILICIDE THIN-FILM FORMATION AT LOW-TEMPERATURES
[J].
LAU, SS
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
LAU, SS
;
FENG, JSY
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
FENG, JSY
;
OLOWOLAFE, JO
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
OLOWOLAFE, JO
;
NICOLET, MA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
NICOLET, MA
.
THIN SOLID FILMS,
1975,
25
(02)
:415
-422
[6]
REACTION-KINETICS OF TUNGSTEN THIN-FILMS ON SILICON (100) SURFACES
[J].
LOCKER, LD
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
LOCKER, LD
;
CAPIO, CD
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
CAPIO, CD
.
JOURNAL OF APPLIED PHYSICS,
1973,
44
(10)
:4366
-4369
[7]
SILICIDE FORMATION IN THIN MOLYBDENUM AND TUNGSTEN FILMS ON SINGLE-CRYSTAL SILICON SUBSTRATES AT RELATIVELY LOW-TEMPERATURES
[J].
OERTEL, B
论文数:
0
引用数:
0
h-index:
0
机构:
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
OERTEL, B
;
SPERLING, R
论文数:
0
引用数:
0
h-index:
0
机构:
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
SPERLING, R
.
THIN SOLID FILMS,
1976,
37
(02)
:185
-194
[8]
RADIOACTIVE SILICON AS A MARKER IN THIN-FILM SILICIDE FORMATION
[J].
PRETORIUS, R
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
PRETORIUS, R
;
RAMILLER, CL
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
RAMILLER, CL
;
LAU, SS
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
LAU, SS
;
NICOLET, MA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
NICOLET, MA
.
APPLIED PHYSICS LETTERS,
1977,
30
(10)
:501
-503
[9]
GROWTH MECHANISM FOR SOLID-PHASE EPITAXY OF SI IN SI (100)/PD2SI/SI(AMORPHOUS) SYSTEM STUDIED BY A RADIOACTIVE-TRACER TECHNIQUE
[J].
PRETORIUS, R
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CALTECH,PASADENA,CA 91125
PRETORIUS, R
;
LIAU, ZL
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CALTECH,PASADENA,CA 91125
LIAU, ZL
;
LAU, SS
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CALTECH,PASADENA,CA 91125
LAU, SS
;
NICOLET, MA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CALTECH,PASADENA,CA 91125
NICOLET, MA
.
JOURNAL OF APPLIED PHYSICS,
1977,
48
(07)
:2886
-2890
[10]
PRETORIUS R, UNPUBLISHED
←
1
2
→