Self-consistent treatment of the vacancy mechanism for metallic diffusion

被引：153

作者：

Huntington, HB ^{[1
]}

机构：

[1] Univ Penn, Randal Morgan Lab Phys, Philadelphia, PA USA

来源：

PHYSICAL REVIEW | 1942年 / 61卷 / 5/6期

关键词：

D O I：

10.1103/PhysRev.61.325

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：325 / 338

页数：14

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