NORMALIZED THERMIONIC-FIELD (T-F) EMISSION IN METAL-SEMICONDUCTOR (SCHOTTKY) BARRIERS

被引:374
作者
CROWELL, CR
RIDEOUT, VL
机构
[1] Department of Materials Science, University of Southern California, Los Angeles
关键词
D O I
10.1016/0038-1101(69)90117-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Thermionic field (T-F) emission in uniformly doped metal-semiconductor (Schottky) barriers is analyzed to yield a normalized solution in closed form for the forward and reverse current (I)-voltage (V) relationship. A quasi one-dimensional approach and Maxwell-Boltzmann statistics are used. The formulation is expressed in terms of the 'flat-band' current density Im, the band bending Eb in the semiconductor depletion region, the materials constant E0 0 (ln[ I Im] = - Eb E0 0 at 0°K in the WKB approximation), and kT. The kinetic energy in units of Eb at which the maximum injection of carriers occurs in the semiconductor is shown to be cosh -2(kT/E0 0). Current flow in the temperature range between pure thermionic emission (kT/E0 0 ≫ 1) and pure field emission (kT/E0 0 ≪ 1) is analyzed and criteria for the transition of T-F emission to thermionic and to field emission are given. Computer solutions for the energy distribution of the injected carriers and for the normalized I-V characteristic are presented in graphical form. The results permit a straightforward calculation of the barrier height and the impurity concentration in the semiconductor from measurements of current density and differential resistance at a single applied bias. Application of these results explains a reported discrepancy between barrier heights deduced from photothreshold, C-V and I-V characteristics of WGaAs and AuGaAs Schottky barriers. A relatively constant excess temperature T0 (i.e., ln I ∝ (T + T0) when V ≫ kT/q) is predicted in the case of large Eb/E0 0 in the higher kT/E0 0 range where thermionic emission is nearly predominant. I ∝ [exp(qV/kT) - 1] is shown to be a general expectation for all Schottky barriers near zero bias when the I-V characteristic is dominated by either thermionic or thermionic-field emission. The assumption of a Gaussian energy distribution of carriers leads to values for the slope of ln I vs. V in reasonable agreement with the results of the computer analysis, but the prediction of the absolute value of the current density deviates rapidly from the computed value when kT/E0 0 departs appreciably from unity. The Gaussian distribution also does not provide the smooth transition from T-F to thermionic emission characteristic of the computer solution. © 1969.
引用
收藏
页码:89 / &
相关论文
共 22 条
[1]  
ATALLA MM, 1962, AF196281637 CONTR
[2]   TUNNELING SPECTROSCOPY IN GAAS [J].
CONLEY, JW ;
MAHAN, GD .
PHYSICAL REVIEW, 1967, 161 (03) :681-+
[3]   ELECTRON TUNNELING IN METAL-SEMICONDUCTOR BARRIERS [J].
CONLEY, JW ;
DUKE, CB ;
MAHAN, GD ;
TIEMANN, JJ .
PHYSICAL REVIEW, 1966, 150 (02) :466-&
[4]  
CROWELL CR, 1965, T METALL SOC AIME, V233, P478
[5]   RICHARDSON CONSTANT FOR THERMIONIC EMISSION IN SCHOTTKY BARRIER DIODES [J].
CROWELL, CR .
SOLID-STATE ELECTRONICS, 1965, 8 (04) :395-&
[6]   BALLISTIC MEAN FREE PATH MEASUREMENTS OF HOT ELECTRONS IN AU FILMS [J].
CROWELL, CR ;
SZE, SM .
PHYSICAL REVIEW LETTERS, 1965, 15 (16) :659-&
[7]   QUANTUM-MECHANICAL REFLECTION OF ELECTRONS AT METAL-SEMICONDUCTOR BARRIERS - ELECTRON TRANSPORT IN SEMICONDUCTOR-METAL-SEMICONDUCTOR STRUCTURES [J].
CROWELL, CR ;
SZE, SM .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (07) :2683-&
[8]   RICHARDSON CONSTANT AND TUNNELING EFFECTIVE MASS FOR THERMIONIC AND THERMIONIC-FIELD EMISSION IN SCHOTTKY BARRIER DIODES [J].
CROWELL, CR .
SOLID-STATE ELECTRONICS, 1969, 12 (01) :55-&
[9]   CURRENT TRANSPORT IN METAL-SEMICONDUCTOR BARRIERS [J].
CROWELL, CR ;
SZE, SM .
SOLID-STATE ELECTRONICS, 1966, 9 (11-1) :1035-&
[10]  
CROWELL CR, 1967, PHYSICS THIN FILMS, V4, P338