HIGH MAGNIFICATION UNSTABLE RESONATOR EXCIMER LASER

被引：15

作者：

JAMES, D

MCKEE, TJ

SKRLAC, W

机构：

[1] Research Limited, Kanata (Ottawa), Ont.

来源：

IEEE JOURNAL OF QUANTUM ELECTRONICS | 1979年 / 15卷 / 05期

关键词：

D O I：

10.1109/JQE.1979.1070014

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

High brightness performance has been achieved in a UV preionized transverse discharge KrF excimer laser by using a high magnification unstable resonator configuration. The properties of laser brightness as a function of resonator magnification are examined. Copyright © 1979 by The Institute of Electrical and Electronics Engineers, Inc.

引用

页码：335 / 336

页数：2

共 5 条

[1] IMPROVED BEAM QUALITY IN DOUBLE DISCHARGE EXCIMER LASERS [J].